Photoresist Curing Tunnel Furnace
A photoresist curing tunnel furnace is a continuous thermal processing equipment specially designed for photoresist processes in semiconductor manufacturing, panel display (LCD/OLED) production, and PCB manufacturing.It is used for pre-bake after photoresist coating, hard-bake, and curing treatment after development. Through precise temperature control and a high-cleanliness environment, the equipment ensures stable performance of the photoresist layer and improves the yield of pattern transfer.
Applications
Pre-bake Process:
Remove solvents from the photoresist.
Hard-bake Process:
Improve the etching resistance of the photoresist.
Post-development Curing:
Enhance the adhesion between the photoresist and the substrate.
Stress Release:
Eliminate mechanical stress inside the photoresist layer.
Parameters
| Parameter | Specification |
|---|---|
| Working Temperature | Room temperature to 300℃ (higher temperatures can be customized) |
| Temperature Control Accuracy | ±1℃ |
| Temperature Uniformity | ±2.5℃ |
| Cleanliness Class | Class 100 / Class 10 |
| Conveyor Speed | 100–2000 millimeters/minute, variable frequency speed regulation |
| Heating Element | Infrared heating tubes or stainless steel heating tubes |
| Power Supply Configuration | 380 Volts, three-phase five-wire system |
Features
Efficient Continuous Operation:
The tunnel structure enables uninterrupted assembly line production.
Precision Temperature Control:
Multi-zone independent PID control ensures a smooth temperature curve.
High Cleanliness:
Built-in high-efficiency particulate air filter (HEPA) and laminar flow circulation design provide a high-cleanliness processing environment.
Nitrogen Protection:
Supports nitrogen-filled low-oxygen operation to prevent photoresist oxidation.
Intelligent Control:
PLC combined with a touch screen supports storage of process parameter recipes.
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